TFDS-462B load lock

TFDS-462B D-shape box chamber High Vacuum Thin Film Deposition System customized to your needs. System designed and built per customer specifications.

Suitable for most of the known devices and technologies such as:

  • Thermal evaporation
  • Electron beam
  • Ion beam
  • Ion beam assisted evaporation
  • Ion beam cleaning
  • Glow discharge cleaning
  • Sputtering, etc

The system is especially designed having in mind the benefits of the load lock and to prolong the working time before chamber need to be open for service:

  • Dual or multi-crystal
  • Larger size crucibles
  • Possibility to add evaporation material without braking vacuum
  • Window shutters, etc

Load lock allows fast cycling with several runs per day.Special cleaning, annealing, oxidation, surface activation using IR heating, UV plasma, Ion bombardment, etc can be added.

Several optional substrate holders available:

  • Planetary
  • LRotating, continuously mode, fixed positioning, adjustable positioning
  • Heated holders up to 900°C
  • Cooled at temperatures starting at -200°C
  • Special holders cryogenic cooled
  • Angle adjustable
  • Lift off special holders